摘要 氧化锌作为宽禁带半导体在室温下具有高激子束缚能(60 meV)、化学性能稳定、良好的压电性能和光学性能等优点,在光发射器件等光电技术领域应用非常广泛。拟通过采用离轴倾角溅射的方法,探究溅射功率对氧化锌薄膜的结晶和光学性质的影响。相比于分子束外延和金属有机化学气相沉积等薄膜生长技术,磁控溅射具有明显的成本优势,薄膜纯度高、致密性以及均匀性良好,适于大尺寸生长。相比于传统的共轴垂直溅射,离轴倾角沉积可以使溅射到基片表面的粒子获得更多的横向迁移能,进而更容易迁移到合适的位点,有利于薄膜的高质量生长。在众多生长参数中,溅射功率是影响薄膜沉积以及薄膜晶体质量等物性的重要因素。因此,将采用射频磁控溅射就不同的溅射功率对氧化锌薄膜的形貌、结构以及发光性质等影响展开研究。 As a wide-bandgap semiconductor,zinc oxide has high exciton binding energy(60 meV),stable chemical properties,good piezoelectric properties and optical properties at room temperature,and is widely used in optoelectronic fields such as light-emitting devices.In this paper,the effect of sputtering power on the crystallization and optical properties of zinc oxide thin films is investigated by using the method of off-axis tilting sputtering.Compared with thin film growth techniques such as molecular beam epitaxy and metal organic chemical vapor deposition,magnetron sputtering has obvious cost advantages.The film has high purity,compactness and uniformity,and is suitable for the growth of large-size films.Compared with the traditional coaxial vertical sputtering,the off-axis inclined sputtering can make the particles sputtered onto the surface of the substrate obtain more lateral migration energy,and thus more easily migrate to a suitable site,which is beneficial to the improvement of the sputtered film.Among many growth parameters,sputtering power is an important factor affecting the physical properties of thin film deposition and thin film crystal quality.Therefore,the morphology,structure and luminescence of zinc oxide thin films with different sputtering powers by RF magnetron sputtering will be used in this paper.
机构地区 长春理工大学理学院 长春中医药大学基础医学院
出处 《长春理工大学学报:自然科学版》 2021年第2期1-6,共6页 Journal of Changchun University of Science and Technology(Natural Science Edition)
基金 国家自然科学基金青年科学基金项目(51602028) 吉林省产业创新专项资金项目(2019C043-6) 吉林省科技发展计划项目(20180804009HJ)。
关键词 氧化锌薄膜 磁控溅射 溅射功率 离轴倾角沉积 zinc oxide thin film magnetron sputtering sputter power off-axis inclined sputtering
分类号 O469 [理学—凝聚态物理]
